By Ban Wong, Franz Zach, Victor Moroz, Anurag Mittal, Greg Starr, Andrew Kahng(auth.)
Realize leading edge instruments that pave the way in which from circuit and actual layout to fabrication processing
Nano-CMOS layout for Manufacturability examines the demanding situations that layout engineers face within the nano-scaled period, corresponding to exacerbated results and the confirmed layout for manufacturability (DFM) technique in the middle of expanding variability and layout technique interactions. as well as discussing the problems caused by the ongoing dimensional scaling in conformance with Moore's legislations, the authors additionally take on complicated concerns within the layout technique to beat the problems, together with using a useful first silicon to aid a predictable product ramp. furthermore, they introduce numerous rising options, together with rigidity proximity results, contour-based extraction, and layout strategy interactions.
This ebook is the sequel to Nano-CMOS Circuit and actual layout, taking layout to know-how nodes past 65nm geometries. it truly is divided into 3 elements:
half One, Newly Exacerbated results, introduces the newly exacerbated results that require designers' consciousness, starting with a dialogue of the lithography elements of DFM, by means of the influence of format on transistor functionality
half , layout recommendations, examines the way to mitigate the impression of technique results, discussing the method had to make sub-wavelength patterning expertise paintings in production, in addition to layout options to house sign, energy integrity, good, tension proximity results, and technique variability
half 3, the line to DFM, describes new instruments had to aid DFM efforts, together with an auto-correction instrument in a position to solving the structure of cells with a number of optimization ambitions, by means of a glance forward into the way forward for DFM
during the e-book, real-world examples simplify complicated innovations, aiding readers see how they could effectively deal with initiatives on Nano-CMOS nodes. It presents a bridge that permits engineers to move from actual and circuit layout to fabrication processing and, in brief, make designs that aren't merely practical, yet that still meet strength and function ambitions in the layout schedule.Content:
Chapter 1 creation (pages 1–17):
Chapter 2 Lithography?Related points of DFM (pages 19–125):
Chapter three interplay of format with Transistor functionality and pressure Engineering options (pages 126–183):
Chapter four sign and gear Integrity (pages 185–255):
Chapter five Analog and Mixed?Signal Circuit layout for Yield and Manufacturability (pages 256–280):
Chapter 6 layout for Variability, functionality, and Yield (pages 281–332):
Chapter 7 Nano?CMOS layout instruments: past Model?Based research and Correction (pages 333–380):
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